|
|
Volumn 4186, Issue , 2001, Pages 762-766
|
|
Is it time to change mask magnification?
a
a
NONE
|
|
Author keywords
Mask magnification; Photomasks; Reticle size; Steppers reduction ration
|
|
Indexed keywords
MASKS;
OPTICAL MULTILAYERS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SUBSTRATES;
MASK MAGNIFICATION;
STEPPERS REDUCTION RATION;
PHOTOLITHOGRAPHY;
|
|
EID: 0035047034
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.410757 Document Type: Conference Paper |
|
Times cited : (2)
|
|
References (0)
|