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Volumn 3873, Issue pt 1, 1999, Pages 243-254
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Cost analysis of 4X and 6X 9-inch reticles for future lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
COST BENEFIT ANALYSIS;
COSTS;
LITHOGRAPHY;
MASKS;
MATHEMATICAL MODELS;
SIZE DETERMINATION;
SUBSTRATES;
MAGNIFICATION;
OPTICAL RETICLE SIZE;
RETICLES;
INSTRUMENT SCALES;
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EID: 0033328212
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (3)
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References (3)
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