SCOPUS 정보 검색 플랫폼

Volumn 7, Issue 11, 2004, Pages

Deposition of high dielectric barium-doped titanium silicon oxide films on silicon using Hexafluorotitanic acid and Barium Nitrate

(3) Lee, Ming Kwei a Tung, Kuan Wen a Yu, Chia Ming a

a NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; CAPACITANCE; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; MASS SPECTROMETRY; OPTOELECTRONIC DEVICES; SEMICONDUCTOR DOPING; SILICON; SUBSTRATES;

DYNAMIC RANDOM ACCESS MEMORIES (DRAMS); ELECTRIC FIELD INTENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); POLYCRYSTALLIZATION;

METALLIC FILMS;

EID: 10044221943 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.1808092 Document Type: Article

Times cited : (3)

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