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Volumn 74, Issue 2, 2002, Pages 249-251
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Characteristics and growth mechanisms of Ti xSi (1-x)O y films by liquid phase deposition
a
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Author keywords
[No Author keywords available]
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Indexed keywords
HEXAFLUOROTITANIC ACID;
LIQUID PHASE DEPOSITION;
TITANIUM SILICATE FILMS;
ANNEALING;
CURRENT DENSITY;
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRIC PROPERTIES;
FILM GROWTH;
LEAKAGE CURRENTS;
LIQUID PHASE EPITAXY;
PERMITTIVITY;
REFRACTIVE INDEX;
SECONDARY ION MASS SPECTROMETRY;
X RAY PHOTOELECTRON SPECTROSCOPY;
TITANIUM COMPOUNDS;
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EID: 0036477622
PISSN: 09478396
EISSN: None
Source Type: Journal
DOI: 10.1007/s003390100882 Document Type: Article |
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Times cited : (6)
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References (9)
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