Deposition of barium titanate films on silicon by barium fluotitanate powder

Journal of Physical Chemistry B

Volumn 106, Issue 19, 2002, Pages 4963-4966

  Lee, M K ^a   Tung, K W ^a   Cheng, C C ^a   Liao, H C ^a   Shih, C M ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION SOLUTIONS;

BARIUM TITANATE; CURRENT DENSITY; LEAKAGE CURRENTS; PERMITTIVITY; POWDER METALS; PRECIPITATION (CHEMICAL); REFRACTIVE INDEX; SILICON; SOLUTIONS; SUBSTRATES;

METALLIC FILMS;

EID: 0037118403     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0134401     Document Type: Article

References (19)

1. Kim, K.; Hwang, C.C.; Senior Member, IEEE; Lee, J.G. IEEE Trans. Electron. Devices 1998, 45, 598-608.
2. Jia, Q.X.; Shi, Z.Q.; Yi, J.; Anderson, W.A. J. Electron. Mater. 1994, 23, 53-56.
3. Jia, Q.X.; Chang, L.H.; Anderson, W.A. J. Electron. Mater. 1994, 23, 551-556.
4. Wills, L.A.; Wessels, B.W.; Richeson, D.S.; Marks, T.J. Appl. Phys. Lett. 1992, 60, 41-43.
5. Zhao, J.; Fuflyigin, V.; Wang, F.V.; Norris, P.E.; Bouthilette, L.; Woods, C. J. Mater. Chem. 1997, 7, 933-936.
6. Mckee, R.A.; Walker, F.J.; Conner, J.R.; Specht, E.D.; Zelmon, D.E. Appl. Phys. Lett. 1991, 59, 782-784.
7. Holmes, A.S.; Syms, R.R.A.; Li, Ming; Green, Mino Appl. Opt. 1993, 32, 4916-4921.
8. Harrison, F.H.P.M.; Kuiper, A.E.T. Mater. Sci. Eng. Rev. 1994, 12.
9. Bahtat, A.; Bouazaoui, M.; Bahtat, M.; Mugnier, J. Opt. Commun. 1994, 111, 55-60.
10. Jia, Q.X.; Chang, L.H.; Anderson, W.A. Thin Solid Films 1995, 259, 264-269.
11. Pita, K.; Cheng, S.D.; Kam, C.H.; Zhou, Y.; Lam, Y.L.; Chan, Y.C. Freeoelectrics 1999, 231, 655-660.
12. Song, M.H.; Lee, Y.H.; Hahn, T.S.; Oh, M.H. J. Appl. Phys. 1996, 79, 3744-3748.
13. Lee, M.K.; Yang, C.N.; Lin, C.H.; Lei, B.H. Jpn. J. Appl. Phys. Part 1 1998, 37, 423-425.
14. Sze, S.M. Semiconductor Devices Physics and Technology; John Wiley & Sons: New York, 1985; Chapter 11.
15. Lee, M.K.; Lin, C.H.; Yang, C.N.; Yang, C.D. Jpn. J. Appl. Phys. 1998, 37, L682-L683.
16. Yeh, C.F.; Chen, C.L.; Lin, G.H. J. Electrochem. Soc. 1994, 141, 3177-3181.
17. Lim, S.W.; Shimogaki, Yukihiro; Nakano, Yashiaki; Tada, Kunio; Komiyama, Hiroshi J. Electrochem. Soc. 1997, 144, 2531-2537.
18. Fukuda, H.; Namioka, S.; Miura, M.; Ishikawa, Y.; Yoshino, M.; Nomura, S. Jpn. J. Appl. Phys. 1999, 38, 6034-6038.
19. Chang, K.M.; Wang, S.W.; Yeh, T.H.; Li, C.H.; Luo, J.J. J. Electrochem. Soc. 1997, 144, 1754-1759.