Improvement of liquid phase deposition of silicon dioxide with hydrochloric acid incorporation

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 6 A, 1998, Pages

  Lee, Ming Kwei ^a   Lin, Ching Hsing ^a   Yang, Ching Nan ^a   Yang, Chi Da ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ASSOCIATION REACTIONS; CAPACITANCE; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; HYDROCHLORIC ACID; LEAKAGE CURRENTS; SILICA;

FLAT BAND VOLTAGE; LIQUID PHASE DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0032090293     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l682     Document Type: Article

References (18)