Ultrasonic sensor for photoresist process monitoring

IEEE Transactions on Semiconductor Manufacturing

Volumn 12, Issue 3, 1999, Pages 332-339

  Morton, Susan L ^b   Degertekin, F Levent ^c   Khuri Yakub, Butrus T ^a,c  

^a IEEE

^b Hughes Aircraft Co   (United States)

^c STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE REFLECTION; GLASS TRANSITION; PHOTORESISTS; PROCESS CONTROL; SEMICONDUCTING FILMS; SENSORS; SILICON WAFERS; TEMPERATURE MEASUREMENT; THICKNESS MEASUREMENT;

POSTBAKE; PROCESS MONITORING; REFLECTION THEORY; SOFTBAKE; ULTRASONIC SENSOR;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033338777     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.778199     Document Type: Article

References (17)

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