Reticle defect printability for sub-0.3k1 Chromeless Phase Lithography(CPL) technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 373-383

  Hsu, Stephen ^a   Van Den Broeke, Dou ^a   Shi, Xuelong ^a   Chen, J Fung ^a   Knose, William ^a   Corcoran, Noel ^a   Vedula, Srinivas ^b   MacNaughton, Craig ^b   Richie, Michael ^b  

^a ASML US Inc   (United States)

^b NONE

Author keywords

Chrome Defect; Chromeless Mask; Chromeless Phase Lithography (CPL); Defect Printability; Defect Sensitivity; KrF; Off Axis Illumination (OAI); Phase Defect

Indexed keywords

DEFECTS; IMAGE ENHANCEMENT; MEASUREMENTS; OPTIMIZATION; PRINTED CIRCUITS; SCANNING ELECTRON MICROSCOPY; SENSITIVITY ANALYSIS; SILICON WAFERS;

DEFECT SENSITIVITY;

LITHOGRAPHY;

EID: 0036456709     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476983     Document Type: Conference Paper

References (6)

1. J.F. Chen, et al., "Binary Halftone Chromeless PSM Technology for λ/4 Optical Lithography," SPIE Vol. 4346-51, 2001.
2. Hsu et al., "Patterning Submicron DRAM Cell by Using Chromeless Phase Lithography", SPIE, Vol. 4691-08, to be published, 2002.
3. Socha et al. "Extending KrF to 100 nm imaging with high-NA and chromeless phase lithography technology ", SPIE, Vol. 4691-44, to be published, 2002.
4. Van Den Broeke, et al., "Complex 2D Pattern Lithography at λ/4 Resolution Using Chromeless Phase Lithography (CPL)" SPIE, Vol. 4691-19, to be published, 2002.
5. J.F. Chen, et al., "CD Error Sensitivity to Sub-Killer Defects at k1 near 0.4", SPIE Vol. 3677, 1999.
6. Nakagawa, et al., "CD Error Sensitivity to Sub-Killer Defects at k1 near 0.4, Part II," Advanced Reticle Symposium, 1999.