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Thin Solid Films

Volumn 406, Issue 1-2, 2002, Pages 145-150

An investigation of tin oxide plasma-enhanced chemical vapor deposition using optical emission spectroscopy

(5) Robbins, J J a Alexander, R T a Xiao, W a Vincent, T L a Wolden, C A a

a Department of Geology and Geological Engineering (United States)

Author keywords

Chemical vapor deposition; Optical spectroscopy; Tin oxide

Indexed keywords

ELECTRIC CONDUCTIVITY; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPECTROSCOPIC ANALYSIS; SUBSTRATES; TIN COMPOUNDS;

OPTICAL EMISSION SPECTROSCOPY (OES);

CONDUCTIVE FILMS;

EID: 0037051221 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00051-2 Document Type: Article

Times cited : (18)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.