Planar CMOS compatible process for the fabrication of buried microchannels in silicon, using porous-silicon technology

Journal of Microelectromechanical Systems

Volumn 12, Issue 6, 2003, Pages 863-872

  Kaltsas, Grigoris ^a   Pagonis, Dimitris Nickos ^a   Nassiopoulou, Androula G ^a  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

Buried microchannels; Microfluidic sensor; Porous silicon technology

Indexed keywords

ELECTROLYTIC POLISHING; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; OPTIMIZATION; POROUS SILICON; SEMICONDUCTING SILICON;

MICROCHANNELS; MICROFLUIDIC THERMAL FLOW SENSOR;

CMOS INTEGRATED CIRCUITS;

EID: 0742269314     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.820270     Document Type: Article

References (37)

1. B. H. Weigl and P. Yager, "Microfluidics - Microfluidic diffusion-based separation and detection," Science, vol. 283, pp. 346-347, 1999.
2. D. D. Cunningham, "Fluidics and sample handling in clinical chemical analysis," Anal. Chim. Acta, vol. 429, pp. 1-18, 2001.
3. R. W. Tjerkstra, J. G. E. Gardeniers, J. J. Kelly, and A. van den Berg, "Multi-walled microchannels: Free-standing porous silicon membranes for use in μTAS," J. Microelectromech. Syst., vol. 9, no. 4, pp. 495-501, 2000.
4. J. Wang, "Electrochemical detection for microscale analytical systems: A review," Talanta, vol. 56, no. 2, pp. 223-231, 2002.
5. S. C. Jakeway, A. J. de Mello, and E. L. Russell, "Miniaturized total analysis systems for biological analysis," Fresen. J. Anal. Chem., vol. 366, no. 6-7, pp. 525-539, 2000.
6. N.T. Nguyen, X. Y. Huang, and T. K. Chuan, "MEMS-micropumps: A review," J. Fluids Eng.-Trans. Asme., vol. 124, no. 2, pp. 384-392. 2002.
7. T. Thorsen, S. J. Maerkl, and S. R. Quake, "Microfluidic large-scale integration," Science, vol. 298, no. 5593, pp. 580-584, 2002.
8. D. J. Beebe, G. A. Mensing, and G. M. Walker, "Physics and applications of microfluidics in biology," Ann. Rev. Biomed. Eng., vol. 4, pp. 261-286, 2002.
9. C. Rusu, R. van't Oever, M. J. de Boer, H. V. Jansen, J. W. Berenschot, M. L. Bennink, J. S. Kanger, B. G. de Grooth, M. Elwenspoek, J. Greve, J. Brugger, and A. van den Berg, "Direct integration of micromachined pipettes in a flow channel for single DNA molecule study by optical tweezers," J. Microelectromech. Syst., vol. 10, pp. 238-245, June 2001.
10. R. C. Anderson, G. J. Bogdan, Z. Barvin, T. D. Dawes, J. Winkler, and K. Roy, "Microfluidic biochemical analysis system," in Proc. Int. Conf. Solid-State Sensors and Actuators, Transducers '97, Chicago, IL, June 16-19, 1997, pp. 477-480.
11. A. Rasmussen, M. Gaitan, L. E. Locascio, and M. E. Zaghloul, "Fabrication techniques to realize CMOS-compatible microfluidic microchannels," J. Microelectromech. Syst., vol. 10, pp. 286-297, June 2001.
12. P. Enoksson, G. Stemme, and E. Stemme, "Silicon tube structures for a fluid-density sensor," Sens. Actuators, Phys. A, vol. 54, no. 1-3, pp. 558-562, 1996.
13. S. C. Terry, J. H. Jerman, and J. B. Angell, "A gas chromatographic air analyzer fabricated on a silicon wafer," IEEE Trans. Electron. Devices, vol. ED-26, pp. 1880-1886, Dec. 1979.
14. S. C. Jacobson, A. W. Moore, and J. M. Ramsey, "Fused quartz substrates for microchip electrophoresis," Anal. Chem., vol. 67, pp. 2059-2063, 1995.
15. V. L. Spiering, J. N. van Moolen, G.-J. Burger, and A. van den Berg, "Novel microstructures and technologies applied in chemical analysis techniques," in Proc. Transducers '97, Chicago, IL, June 16-19, 1997, pp. 511-514.
16. M. Richter, P. Woias, and D. Weiss, "Microchannels for applications in liquid dosing and flow-rate measurement," Sens. Actuators, Phys. A, vol. 62, no. 1-3, pp. 480-483, 1996.
17. M. J. de Boer, R. W. Tjerkstra, J. W. Berenschot, H. V. Jansen, G. J. Burger, J. G. E. Gardeniers, M. Elwenspoeck, and A. van den Berg, "Micromachining of buried micro channels in silicon," J. Microelectromech. Syst., vol. 9, pp. 94-103, Mar. 2000.
18. A. K. Mallik, G. P. Peterson, and M. H. Weichold, "Fabrication of vapor-deposited micro heat-pipe arrays as an integral-part of semiconductor-devices," J. Microelectromech. Syst., vol. 4, pp. 119-131, Sept. 1995.
19. W. Kaplan, H. Elderstig, and C. Vieider, "A novel fabrication method of capillary tubes on quartz for chemical analysis applications," in Proc. IEEE MEMS '94, Int. Conf. MEMS, Oiso, Japan, Jan. 25-28, 1994, pp. 63-68.
20. P. F. Man, D. K. Jones, and C. H. Mastrangelo, "Microfluidic plastic capillaries on silicon substrates," in Proc. Int. Workshop on MEMS, Nagoya, Japan, Jan. 26-30, 1997, pp. 311-316.
21. I. Papautsky, J. Brazzle, H. Swerdlow, and A. B. Frazier, "A low temperature IC-compatible process for fabricating surface micromachined metallic microchannels," J. Microelectromech. Syst., vol. 7, pp. 267-273, June 1998.
22. T. K. Jun and C.-J. Kim, "Valveless pumping using traversing vapor bubles in microchannels," J. Appl. Phys., vol. 83, no. 11, pp. 5658-5664, 1998.
23. L. J. Guerin et al., "Simple and low cost fabrication of embedded microchannels by using a new thick-film photoplastic," in Proc. Transducers '97, Chicago, IL, 1997, pp. 1419-1422.
24. R. Rapp, W. K. Schomburg, D. Maas, J. Schulz, and W. Stark, "Liga micropump for gases and liquids," Sens. Actuators, Phys. A, vol. 40, no. 1, pp. 57-61, 1994.
25. W. K. Schomburg, J. Vollmer, B. Bustgens, J. Fahrenberg, H. Hein, and W. Menz, "Microfluidic components in LIGA technique," J. Micromech. Microeng., vol. 4, pp. 186-191, 1994.
26. R. L. Smith and S. D. Collins, "Porous silicon formation mechanisms," J. Appl. Phys., vol. 71, no. 8, pp. R1-R22, 1992.
27. C. J. M. Eijkel, J. Branebjerg, M. Elwenspoek, and F. C. M. Van de Pol, "A new technology for micromachining of silicon - Dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structures," IEEE Electron Device Lett., vol. 11, pp. 588-589, Dec. 1990.
28. X. G. Zhang, S. D. Collins, and R. L. Smith, "Porous silicon formation and electropolishing of silicon by anodic polarization in HF solution," J. Electrochem. Soc., vol. 136, no. 5, pp. 1561-1565, 1989.
29. K. Imai and H. Unno, "FIPOS (full isolation by porous oxidized silicon) technology and its application to LSI's," IEEE Trans. Electron. Devices, vol. ED-31, no. 3, pp. 297-302, 1984.
30. G. Kaltsas and A. G. Nassiopoulou, "Bulk silicon micromachining using porous silicon sacrificial layers," Microelec. Eng., vol. 35, pp. 397-400. 1997.
31. ____, "Frontside bulk silicon micromachining using porous-silicon technology," Sens. Actuators, Phys. A, vol. 65, pp. 175-179, 1998.
32. A. Halimaoui, "Electrochemical and chemical behavior of porous silicon layers: The role of the material wettability and its high specific surface area," E. Appl. Sci., vol. 244, pp. 11-22, 1993.
33. W. Lang, P. Steiner, and H. Sandmaier, "Porous silicon: A novel material for microsystems," Sens. Actuators, Phys. A, vol. 51, pp. 31-36, 1995.
34. C. Ducso, E. Vazsonyi, M. Adam, I. Szabo, I. Barsony, J. G. E. Gardeniers, and A. van den Berg, "Porous silicon bulk micromachining for thermally isolated membrane formation," Sens. Actuators, Phys. A, vol. 60, 1-3, pp. 235-239, 1997.
35. D. Pagonis, G. Kaltsas, and A. G. Nassiopoulou, "Implantation masking technology for selective porous silicon formation," in Int. Conf. on Porous Semiconductors Science and Technology (PSST 2002), Tenerife, Spain, Mar. 10-15, 2002.
36. N. H. Zoubir, M. Vergnat, T. Delatour, A. Burneau, P. de Donato, and O. Barres, "Natural oxidation of annealed chemically etched porous silicon," Thin Solid Films, vol. 255, no. 1-2, pp. 228-230, 1995.
37. S. Wu, Q. Lin, Y. Yuen, and Y.-C. Tai, "MEMS flow sensor for nanofluidic applications," Sens. Actuators, Phys. A, vol. 89, pp. 152-158, 2001.