Narrow resonance profiling study of the oxidation of Ti1-XALXN barrier layer

Materials Research Society Symposium - Proceedings

Volumn 596, Issue , 2000, Pages 97-102

  Hugon, M C ^a   Desvignes, J M ^a   Letendu, F ^a   Agius, B ^a   Vickridge, I ^b   Kim, D J ^c   Ayguavives, F ^c   Kingon, A I ^c  

^a UNIV PARIS SUD   (France)

^b SORBONNE UNIVERSITÉ   (France)

^c North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; CRYSTALLIZATION; ELECTRODES; INTERDIFFUSION (SOLIDS); OXIDATION; RAPID THERMAL ANNEALING; RESONANCE; SPUTTER DEPOSITION; TITANIUM ALLOYS;

DIFFUSION BARRIER; PEROVSKITE DIELECTRICS; TITANIUM ALUMINUM NITRIDE;

THIN FILMS;

EID: 0033696217     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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