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Volumn 294, Issue 1-2, 1997, Pages 153-156

New Ge substrate cleaning method for Si1-x-yGexCy MOMBE growth

(4) Akane, T a Okumura, H a Tanaka, J a Matsumoto, S a

Author keywords

Auger electron spectroscopy; Germanium; Rutherford backscattering spectroscopy; Surface cleaning; Transmission electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

ETCHING; METALLORGANIC VAPOR PHASE EPITAXY; MOLECULAR BEAM EPITAXY; PEROXIDES; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SURFACE CLEANING;

GERMANIUM WAFERS; METALLORGANIC MOLECULAR BEAM EPITAXY;

SEMICONDUCTING GERMANIUM COMPOUNDS;

EID: 0031074059 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)09258-9 Document Type: Article

Times cited : (11)

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