Characterization of Si3N4 thin films prepared by r.f. magnetron sputtering

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 67-71

  Vila, M ^a   Prieto, C ^a   Miranzo, P ^b   Osendi, M I ^b   Ramirez R ^c  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b INSTITUTO DE CERÁMICA Y VIDRIO   (Spain)

^c UNIVERSIDAD CARLOS III DE MADRID   (Spain)

Author keywords

Optical spectroscopy; Resistivity; Silicon nitride; Thin films

Indexed keywords

CERAMIC MATERIALS; ELECTRIC CONDUCTIVITY; HARDNESS; HIGH TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; THIN FILM TRANSISTORS; THIN FILMS;

GATE DIELECTRIC LAYER;

SILICON NITRIDE;

ELECTRICAL RESISTANCE; FILM; SILICON NITRIDE; SPUTTERING;

EID: 4243545708     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01600-0     Document Type: Article

References (13)