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Volumn 179, Issue 1-4, 2001, Pages 156-160

Macroscopic and microstructural properties of CSi x N y thin films deposited by RF nitrogen-plasma-assisted pulsed laser deposition

(2) Tharigen T a Lorenz, M a

a UNIVERSITY OF LEIPZIG (Germany)

Author keywords

Carbon silicon nitride; Hardness; Laser ablation; Local bonding; Microstructure; TEM

Indexed keywords

CRYSTAL ORIENTATION; FILM GROWTH; HARDNESS; HEATING; LASER ABLATION; METALLOGRAPHIC MICROSTRUCTURE; PLASMA SOURCES; PULSED LASER DEPOSITION; SILICON NITRIDE; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

RADIO FREQUENCY NITROGEN-PLASMA-ASSISTED PULSED LASER DEPOSITION;

METALLIC FILMS;

EID: 0035898732 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(01)00275-6 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.