SCOPUS 정보 검색 플랫폼

Surface and Interface Analysis

Volumn 35, Issue 13 SPEC. ISS., 2003, Pages 1028-1033

Non-destructive analysis of ultrathin dielectric films

(4) Champaneria, R a Mack, P a White, R a Wolstenholme, J a

a Thermo Electron (United Kingdom)

Author keywords

ARXPS; Hafnium oxide; Overlayer; Silicon; Thickness; XPS

Indexed keywords

HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); NONDESTRUCTIVE EXAMINATION; SILICATES; SILICON; SURFACE TREATMENT; THICKNESS MEASUREMENT; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC LAYERS; SURFACE PRETREATMENT;

DIELECTRIC FILMS;

EID: 0346277018 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/sia.1619 Document Type: Conference Paper

Times cited : (36)

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