Thermal barrier coatings produced by chemical vapor deposition

Science and Technology of Advanced Materials

Volumn 4, Issue 4, 2003, Pages 397-402

  Vargas Garcia, J R ^a,b   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

Author keywords

Chemical vapor deposition; Columnar structure; Deposition rate; Laser CVD; Plasma CVD; Thermal barrier coating; Yttria stabilized zirconia

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; MICROSTRUCTURE; PHYSICAL VAPOR DEPOSITION; PLASMA SPRAYING; SUPERALLOYS; THERMAL BARRIER COATINGS; THERMAL EXPANSION;

COLUMNAR STRUCTURE;

ZIRCONIA;

EID: 0242636469     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1468-6996(03)00048-2     Document Type: Review

References (31)

1. Chun S.Y., Mizutani N. The transport mechanism of YSZ thin films prepared by MOCVD. Appl. Surf. Sci. 171:2001;82-88.
2. 2 thin films prepared by metalorganic chemical vapor deposition. Jpn. J. Appl. Phys. 37:1998;6229-6232.
3. Chour K.W., Chen J., Xu R. Metal-organic vapor deposition of YSZ electrolyte layers for solid oxide fuel cell applications. Thin Solid Films. 304:1997;106-112.
4. Akiyama Y., Imaishi N., Shin Y.S., Jung S.C. Macro- and micro-scale simulation of growth rate and composition in MOCVD of yttria-stabilized zirconia. J. Cryst. Growth. 241:2002;352-362.
5. Yamane H., Hirai T. Yttria stabilized zirconia transparent films prepared by chemical vapor deposition. J. Cryst. Growth. 94:1989;880-884.
6. Ferrao L.P.C., Bowen H.K., Kingery W.D. Chemical vapor-deposition of solid-solutions in system zirconia-yttria. Am. Ceram. Soc. Bull. 52:1973;345.
7. Hwang S.C., Shin H.S. Effect of deposition temperature on the growth of yttria-stabilized zirconia thin films on Si(111) by chemical vapor deposition. J. Am. Ceram. Soc. 82:1999;2913-2915.
8. Holzschuh H., Suhr H. Textured (100) yttria-stabilized zirconia thin films deposited by plasma-enhanced chemical vapor deposition. Appl. Phys. Lett. 59:1991;470-472.
9. Cao C.B., Wang J.T., Yu W.J., Peng D.K., Meng G.Y. Research on YSZ thin films prepared by plasma-CVD process. Thin Solid Films. 249:1994;163-167.
10. Wang H.B., Xia C.R., Meng G.Y., Peng D.K. Deposition and characterization of YSZ thin films by aerosol-assisted CVD. Mater. Lett. 44:2000;23-28.
11. Krellmann M., Selbmann D., Schmatz U., Weiss F. YSZ buffer layers on technical substrates for HTSC current applications prepared by AAMOCVD. J. Alloys Compd. 251:1997;307-309.
12. Hampikian J.M., Carter W.B. The combustion chemical vapor deposition of high temperature materials. Mater. Sci. Engng A. 267:1999;7-17.
13. Bertrand G., Mevrel R. Zirconia coatings realized by microwave plasma-enhanced chemical vapor deposition. Thin Solid Films. 292:1997;241-246.
14. 2 from β-diketonetes. J. Phys. IV, Colloque C3. 3:1993;305-312.
15. Whal G., Nemetz W., Giannozzi M., Rushworth S., Baxter D., Archer N., Cernuschi F., Boyle N. Chemical vapor deposition of TBG: an alternative process for gas turbine components. Trans. ASME. 123:2001;520-524.
16. Dubourdieu C., Kang S.B., Li Y.Q., Kulesha G., Gallois B. Solid single-source metal organic chemical vapor deposition of yttria-stabilized zirconia. Thin Solid Films. 339:1999;165-173.
17. Tu R., Kimura T., Goto T. Rapid synthesis of yttria-partially-stabilized zirconia films by metal-organic chemical vapor deposition. Mater. Trans. 43:2002;2354-2356.
18. Préauchat B., Drawin S. Properties of PECVD-deposited thermal barrier coatings. Surf. Coat. Technol. 142-144:2001;835-842.
19. Préauchat B., Drawin S., Landais S. Characterization of plasma-enhanced chemical vapor deposited thermal barriers made of yttrium-stabilized zirconia used for turbine blades. J. Phys. IV. 10:2000;149-154.
20. Préauchat B., Drawin S. Isothermal and cycling properties of zirconia-based thermal barrier coatings deposited by PECVD. Surf. Coat. Technol. 146-147:2001;94-101.
21. Kimura T., Goto T. Rapid synthesis of yttria-stabilized zirconia films by laser chemical vapor deposition. Mater. Trans. 44:2003;421-424.
22. 3 from metalorganic compounds in different reactors. Key Engng Mater. 153-154:1998;1-36.
23. Igumenov I.K., Turgambaeva A.E., Semyannikov P.P. General aspects of surface chemistry of metal beta-diketonates. J. Phys. IV France. 11:2001;505-515.
24. 3 thin film growth by low-pressure metalorganic chemical vapor deposition using b-diketonate complexes. J. Cryst. Growth. 147:1995;130-146.
25. 2 films using injection-LPCVD. Allendorf M.D., Bernard C. Proceedings of the 14th International Conference and EUROCVD-11, Electrochemical Society Proceedings. vol. 97-25:1997;417-424.
26. 3 from metalorganic compounds in different reactors. Surf. Coat. Technol. 125:2000;400-406.
27. Powell C.F. Transport processes. Powell C.F., Oxley J.H., Blocher J.M. Jr. Vapor Deposition. 1966;102-125 Wiley, London.
28. Vescan V. Introduction and general discussion. Glocker D.A., Shah S.I. Handbook of Thin Film Process Technology. 1995;B1.0:1-B1.0:12 IOP Publishers.
29. Pattanaik A.K., Sarin V.K. Basic principles of CVD thermodynamics and kinetics. Park J.H. Chemical Vapor Deposition. Surf. Engng Ser. vol. 2:2001;23-43 ASM International.
30. Miyazaki H., Kimura T., Goto T. Acceleration of deposition rates in a chemical vapor deposition process by laser irradiation. Jpn. J. Appl. Phys. 42:2003;L316-L318.
31. Leyens C., Schulz U., Pint B.A., Wright I.G. Influence of electron beam physical vapor deposited thermal barrier coating microstructure on thermal barrier coating system performance under cyclic oxidation conditions. Surf. Coat. Technol. 120-121:1999;68-76.