The combustion chemical vapor deposition of high temperature materials

Materials Science and Engineering: A

Volumn 267, Issue 1, 1999, Pages 7-18

  Hampikian, J M ^a   Carter, W B ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

Combustion chemical vapor deposition; High temperature materials; Oxidation protection; Thermogravimetric analysis

Indexed keywords

ALUMINA; COATINGS; COMBUSTION; HIGH TEMPERATURE PROPERTIES; NICKEL ALLOYS; OXIDATION RESISTANCE; OXIDES; SILICA; THERMOGRAVIMETRIC ANALYSIS; ZIRCONIA;

COMBUSTION CHEMICAL VAPOR DEPOSITION; HIGH TEMPERATURE MATERIALS; OXIDATION PROTECTION;

CHEMICAL VAPOR DEPOSITION;

EID: 0003026123     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5093(99)00067-2     Document Type: Article

References (26)

1. Hunt A.T., Carter W.B., Cochran J.K. Jr. Appl. Phys. Letts. 63(2):1993;266.
2. A.T. Hunt, J.K. Cochran, W.B. Carter, Combustion chemical vapor deposition of films and coatings. US patent number 5,652,021, issued 7/29/97.
3. Book G.W., Carter W.B., Polley T.A., Kozaczek K.J. Thin Solid Films. 287(1-2):1996;32.
4. Hendrick M.R., Hampikian J.M., Carter W.B. J. Electrochem. Soc. 145(11):1998;3986.
5. A. Alexiou, M.R. Hendrick, J.M. Hampikian, Properties and processing of vapor deposited coatings, in: M. Pickering, B.W. Sheldon, W.Y. Lee, R.N. Johnson (Eds.), MRS Proceedings, Vol. 555, November 30-December 4, 1998, Boston, MA (in press).
6. Valek B.C., Hampikian J.M. Surf. Coat. Tech. 94-95:1997;13.
7. W.B. Carter. G.W. Book, T.A. Polley, D.W. Stollberg, and J.M. Hampikian, Thin Solid Films (In press).
8. Stollberg D.W., Carter W.B., Hampikian J.M. Surf. Coat. Tech. 94-95:1997;137.
9. Carter W.B., Hampikian J.M., Godirey S., Polley T.A. Mater. Manuf. Process. 10(5):1995;1007.
10. W.B. Carter, Flame assisted deposition of oxide coatings, in: N.B. Dahotre, T.S. Sudarshan (Eds.), Intermetallic and Ceramic Coatings, Marcel Dekker, New York, 1999, pp. 233-266.
11. Koguchi M., Matsuda Y., Kinoshito E., Hirabayashi K. Jpn. J. Appl. Phys. 29(1):1990;L33.
12. McHale J., Schaeffer R.W., Kabebe A., Macho J., Salomon R.E. J. Supercond. 5(6):1992;511.
13. Ichinose H., Shiwa Y., Nagano M. Jpn. J. Appl. Phys. 33:1994;5903.
14. Ichinose H., Shiwa Y., Nagano M. Jpn. J. Appl. Phys. 33:1994;5907.
15. K.-L. Choy, I. Wiedmann, B. Derby, in: P. Vincenzini (Ed.), Advances in Inorganic Films and Coatings, Techna Srl, 1995.
16. U.S. Patents: 3,880,112 (1975): 3,890,391 (1974).
17. R.F. Bunshah, in: R.F. Bunshah (Ed.), Handbook of Deposition Technologies for Films and Coatings, 2nd ed., Noyes, Park Ridge, N.J. 1994, p. 24.
18. Hou P.Y., Stringer J. Mater. Sci. Eng. A202:1995;1.
19. Wang L., May S.W., Browner R.F., Pollock S.H. J. Anal. At. Spectrum. 11:1996;1137.
20. Silvestri V.J., Osburn C.M., Ormond D.W. J. Electrochem. Soc. 125(6):1978;902.
21. Doychak J., Smialek J.L., Mitchell T.E. Met. Trans. 20A:1989;499.
22. Pint B.A. Solid State Ionics. 78:1995;99.
23. J.M. Hampikian, D.I. Potter, Oxid. Met. 38 (1992).
24. Whittle D.P., Stringer J. Phil. Trans. R. Soc. Lond. A. 295:1980;309.
25. Ramanathan L.V. Corr. Sci. 35:1993;871.
26. Roure S., Czerwinski F., Petric A. Oxid Met. 42:1994;75.