Study on Er3+ emission from the erbium-doped hydrogenated amorphous silicon suboxide film

Journal of Applied Physics

Volumn 94, Issue 9, 2003, Pages 5599-5604

  Chen, C Y ^a   Chen, W D ^a   Song, S F ^a   Xu, Z J ^a   Liao, X B ^a   Li, G H ^a   Dina, K ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEHYDROGENATION; DOPING (ADDITIVES); FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; OXIDATION; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

NONRADIATIVE RECOMBINATION; PHOTOGENERATED CARRIERS;

AMORPHOUS SILICON;

EID: 0242552139     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1615691     Document Type: Article

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