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Volumn 83, Issue 17, 2003, Pages 3501-3503

Shouldering in B diffusion profiles in Si: Role of di-boron diffusion

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BINDING ENERGY; BORON; CRYSTAL IMPURITIES; DIFFUSION; DISSOCIATION; FERMI LEVEL; STRESSES;

EID: 0242498432     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1619219     Document Type: Article
Times cited : (7)

References (19)
  • 7
    • 0000971763 scopus 로고    scopus 로고
    • J. Zhu, T. Diaz de Rubia, L. H. Yang, and C. Maihiot, Phys. Rev. B 54, 4741 (1996); J. Zhu, Comput. Mater. Sci. 12, 309 (1998).
    • (1998) Comput. Mater. Sci. , vol.12 , pp. 309
    • Zhu, J.1
  • 9
    • 0242563160 scopus 로고    scopus 로고
    • note
    • 1/2≈56.46.
  • 12
    • 0000361031 scopus 로고
    • P. M. Fahey, P. B. Griffin, and J. D. Plummer, Rev. Mod. Phys. 61, 289 (1989); W. Shockley and J. T. Last, Phys. Rev. 107, 392 (1957).
    • (1957) Phys. Rev. , vol.107 , pp. 392
    • Shockley, W.1    Last, J.T.2
  • 13
    • 0242563183 scopus 로고    scopus 로고
    • note
    • x, where p and n are the extrinsic and intrinsic carrier concentration, respectively. Here the subscript i indicates the value obtained under intrinsic conditions.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.