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Volumn 18, Issue 3, 2000, Pages 797-801
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Characterization of magnetron-sputtered partially ionized deposition as a function of metal and gas species
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Author keywords
[No Author keywords available]
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Indexed keywords
ARGON;
ASPECT RATIO;
CATHODES;
COPPER;
IONIZATION;
KRYPTON;
MAGNETRON SPUTTERING;
NEON;
PLASMA APPLICATIONS;
QUARTZ APPLICATIONS;
SUBSTRATES;
TITANIUM;
INDUCTIVELY COUPLED PLASMAS (ICP);
QUARTZ CRYSTAL MICROBALANCE (QCM);
SPUTTER DEPOSITION;
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EID: 0034187025
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.582257 Document Type: Article |
Times cited : (10)
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References (18)
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