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Volumn , Issue , 2001, Pages 382-387

Characterization of arc discharge plasmas in the combined steered arc/unbalanced magnetron deposition process

Author keywords

Adhesion; Arc vaporization; Etching cleaning (plasma); Optical emission (plasma)

Indexed keywords

COATING TECHNIQUES; ELECTRIC ARCS; EMISSION SPECTROSCOPY; ETCHING; INTERFACES (MATERIALS); ION BOMBARDMENT; ION IMPLANTATION; ION SOURCES; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION; SPUTTER DEPOSITION; STRESS ANALYSIS; SURFACE CLEANING;

EID: 0035655383     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (15)
  • 2
    • 0001720167 scopus 로고    scopus 로고
    • Ion charge state distributions of vacuum arc plasmas: The origin of species
    • (1997) Phys. Rev. , vol.E55 , Issue.1 , pp. 969
    • Anders, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.