-
1
-
-
0034247128
-
Transparent Conducting Oxides
-
D.S. Ginley, C. Bright, "Transparent Conducting Oxides," MRS Bulletin 25 15, 2000.
-
(2000)
MRS Bulletin
, vol.25
, pp. 15
-
-
Ginley, D.S.1
Bright, C.2
-
2
-
-
0034517397
-
Low-temperature deposition of ITO thin films by ion beam sputtering
-
D. Kim, Y. Han, J. Cho, S. Koh, "Low-temperature deposition of ITO thin films by ion beam sputtering," Thin Solid Films, 377-378, 81, 2000.
-
(2000)
Thin Solid Films
, vol.377-378
, pp. 81
-
-
Kim, D.1
Han, Y.2
Cho, J.3
Koh, S.4
-
3
-
-
0037246596
-
Flow rate and interface roughness of zinc oxide thin films deposited by spray pyrolysis technique
-
J. Ebothé, A. El Hichou, P. Vautrot, M. Addou, "Flow rate and interface roughness of zinc oxide thin films deposited by spray pyrolysis technique," J. Appl. Phys., 93, 1, 632, 2003.
-
(2003)
J. Appl. Phys.
, vol.93
, Issue.1
, pp. 632
-
-
Ebothé, J.1
El Hichou, A.2
Vautrot, P.3
Addou, M.4
-
4
-
-
0030395864
-
Variations in microstructure and composition of indium tin oxidefilms with the deposition technique
-
M. Rottmann, H. Hennig, B. Ziemer, R. Kalaehnke, K.H. Heckner, "Variations in microstructure and composition of indium tin oxidefilms with the deposition technique," J.Mat. Sci., 31, 6495, 1996.
-
(1996)
J. Mat. Sci.
, vol.31
, pp. 6495
-
-
Rottmann, M.1
Hennig, H.2
Ziemer, B.3
Kalaehnke, R.4
Heckner, K.H.5
-
5
-
-
0032624002
-
Highly conducting indium tin oxide (ITO) thin films deposited by pulsed laser ablation
-
P.O. Adurodija, H. Izumi, T. Ishihara, H. Yoshioka, K. Yamada, H. Matsui, M. Motoyama, "Highly conducting indium tin oxide (ITO) thin films deposited by pulsed laser ablation," Thin Solid Films 350, 79, 1999.
-
(1999)
Thin Solid Films
, vol.350
, pp. 79
-
-
Adurodija, P.O.1
Izumi, H.2
Ishihara, T.3
Yoshioka, H.4
Yamada, K.5
Matsui, H.6
Motoyama, M.7
-
6
-
-
0033359718
-
Deposition of transparent conducting indium-tin-oxide films by the r.f.-superimposed DC sputtering technology
-
M. Bender, J. Trübe, J. Stollenwerk, "Deposition of transparent conducting indium-tin-oxide films by the r.f.-superimposed DC sputtering technology," Thin SolidFilms, 354, 100, 1999.
-
(1999)
Thin Solid Films
, vol.354
, pp. 100
-
-
Bender, M.1
Trübe, J.2
Stollenwerk, J.3
-
7
-
-
0242272696
-
BIGMAG: Sputtering cathode for large area substrates
-
Korea, Sept. 28th
-
th International Display Research Conference in Seoul, Korea, 547, Sept. 28th, 1998.
-
(1998)
th International Display Research Conference in Seoul
, vol.547
-
-
Driessen, J.1
Cassagne, V.2
Deschamps, A.3
Koepfli, R.4
Gruenenfelder, P.5
Haag, W.6
-
10
-
-
0035556711
-
Internal stress of ITO, IZO and GZO films deposited by RF and DC magnetron sputtering
-
T. Sasabayashi, P.K. Song, Y. Shigesato, K. Utsumi, A. Kaijo, A. Mitsui, "Internal stress of ITO, IZO and GZO films deposited by RF and DC magnetron sputtering," Mat. Res. Soc. Symp. Proc., 666, F2.4.1, 2001.
-
(2001)
Mat. Res. Soc. Symp. Proc.
, vol.666
-
-
Sasabayashi, T.1
Song, P.K.2
Shigesato, Y.3
Utsumi, K.4
Kaijo, A.5
Mitsui, A.6
-
11
-
-
0037439419
-
Effect of microstructures on nanocrystallite nucleation and growth in hydrogenated amorphous indium-tin-oxide films
-
M. Ando, E. Nishimura, K. Onisawa, T. Minemura, "Effect of microstructures on nanocrystallite nucleation and growth in hydrogenated amorphous indium-tin-oxide films," J. Appl. Phys., 93, 2, 1032, 2003.
-
(2003)
J. Appl. Phys.
, vol.93
, Issue.2
, pp. 1032
-
-
Ando, M.1
Nishimura, E.2
Onisawa, K.3
Minemura, T.4
-
12
-
-
0033311374
-
Novel transparent conductive Indium-Zinc-Oxide thin films with unique properties
-
H. Takatsuji, S. Tsuji, K. Kuroda, H. Saka, "Novel transparent conductive Indium-Zinc-Oxide thin films with unique properties," Mat. Transactions, JIM, 40, 9, 899, 1999.
-
(1999)
Mat. Transactions, JIM
, vol.40
, Issue.9
, pp. 899
-
-
Takatsuji, H.1
Tsuji, S.2
Kuroda, K.3
Saka, H.4
|