Internal stress of ITO, IZO and GZO films deposited by RF and DC magnetron sputtering

Materials Research Society Symposium - Proceedings

Volumn 666, Issue , 2001, Pages F241-F246

  Sasabayashi, T ^a   Song, P K ^a   Shigesato, Y ^a   Utsumi, K ^b   Kaijo, A ^c   Mitsui, A ^d  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b TOSOH CORPORATION   (Japan)

^c IDEMITSU KOSAN CO LTD   (Japan)

^d ASAHI GLASS CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ANNEALING; COMPRESSIVE STRESS; CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; OXIDES; POLYCRYSTALLINE MATERIALS; RESIDUAL STRESSES; TENSILE STRESS;

CANTILEVER METHOD;

CONDUCTIVE FILMS;

EID: 0035556711     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-666-f2.4     Document Type: Article

References (4)