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Volumn 220, Issue 1-4, 2003, Pages 46-50

Field emission from quantum size GaN structures

Author keywords

GaN field emitter; Quantum size

Indexed keywords

ETCHING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR DOPING; SEMICONDUCTOR QUANTUM DOTS;

EID: 0142186110     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00750-5     Document Type: Article
Times cited : (14)

References (8)
  • 7
    • 0035927016 scopus 로고    scopus 로고
    • Field emission from GaN surface roughened by hydrogen plasma treatment
    • Sugino T., Hori T., Kimura C., Yamamoto T. Field emission from GaN surface roughened by hydrogen plasma treatment. Appl. Phys. Lett. 78(21):2001;3229-3231.
    • (2001) Appl. Phys. Lett. , vol.78 , Issue.21 , pp. 3229-3231
    • Sugino, T.1    Hori, T.2    Kimura, C.3    Yamamoto, T.4
  • 8
    • 0000198240 scopus 로고    scopus 로고
    • Rapid evaluation of dislocation densities in n-type GaN films using photoenhanced wet etching
    • Youtsey C.et al. Rapid evaluation of dislocation densities in n-type GaN films using photoenhanced wet etching. Appl. Phys. Lett. 74(23):1999;3537.
    • (1999) Appl. Phys. Lett. , vol.74 , Issue.23 , pp. 3537
    • Youtsey, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.