Suppression of native oxide growth in sputtered TaN films and its application to Cu electroless plating

Journal of Applied Physics

Volumn 94, Issue 7, 2003, Pages 4697-4701

  Wang, Zenglin ^a   Yaegashi, Osamu ^a   Sakaue, Hiroyuki ^a   Takahagi, Takayuki ^a   Shingubara, Shoso ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLESS PLATING; ETCHING; TANTALUM COMPOUNDS; ULSI CIRCUITS; X RAY PHOTOELECTRON SPECTROSCOPY;

BARRIER LAYERS;

THIN FILMS;

EID: 0142120830     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1609644     Document Type: Article

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