Cluster ion beam processing

Materials Science in Semiconductor Processing

Volumn 1, Issue 1, 1998, Pages 27-41

  Yamada, Isao ^a   Matsuo, Jiro ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; DEPOSITION; ETCHING; ION BEAMS; MOLECULES; SEMICONDUCTOR JUNCTIONS; SEMICONDUCTOR MATERIALS; THIN FILMS;

ATOMICALLY SMOOTH SURFACE FORMATION; HIGH QUALITY THIN FILM DEPOSITION; HIGH RATE ETCHING; ION BEAM PROCESSING; SHALLOW JUNCTION FORMATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032035988     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00006-7     Document Type: Article

References (30)

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