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Volumn 74, Issue 1, 2002, Pages 104-108

High quality ITO film formation by the simultaneous use of cluster ion beam and laser irradiation

Author keywords

ITO film formation; KrF laser irradiation; O2 cluster ion beam

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; GLASS; INDIUM COMPOUNDS; ION BEAMS; LASER BEAM EFFECTS; SUBSTRATES; TIN;

EID: 0036466919     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(01)00479-5     Document Type: Article
Times cited : (24)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.