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Volumn 21, Issue 5, 2003, Pages 1655-1664

Oxygenated polymeric thin films deposited from toluene and oxygen by remote plasma enhanced chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASTIC FILMS; TOLUENE;

EID: 0142090638     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1597891     Document Type: Conference Paper
Times cited : (6)

References (38)
  • 30
    • 0142057876 scopus 로고    scopus 로고
    • National Institute of Standard and Technology, http://physics.nist.gov (2002).
    • (2002)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.