Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and ALN subcycles in atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 5, 2003, Pages

  Lee, Yong Ju ^a   Kang, Sang Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; CHEMICAL VAPOR DEPOSITION; COPPER; TITANIUM NITRIDE; ULSI CIRCUITS;

ATOMIC LAYER DEPOSITION;

THIN FILMS;

EID: 0142027025     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1590963     Document Type: Conference Paper

References (21)

1. S. R. Kurtz and R. G. Gordon, Thin Solid Films 140, 277 (1986).
2. M. R. Hilton, L. R. Narasimhan, S. Nakamura, M. Salmeron, and G. A. Somarjai, Thin Solid Films 139, 247 (1986).
3. A. Sherman, Jpn. J. Appl. Phys., Part 1 30, 3553 (1991).
4. L. H. Dubois, B. R. Zegarski, and G. S. Girolami, J. Electrochem. Soc. 139, 3603 (1992).
5. M. Juppo, A. Rahtu, and M. Ritala, Chem. Mater. 14, 281 (2002).
6. S. M. Rossnagel, A. Sherman, and F. Turner, J. Vac. Sci. Technol. B 18, 2016 (2000).
7. F. Adibi, I. Petrov, L. Hultman, U. Wahlstrom, T. Shimizu, D. McIntyre, J. E. Greene, and J.-E. Sundgren, J. Appl. Phys. 69, 6437 (1991).
8. S. Ikeda, S. Gilles, and B. Chenevier, Thin Solid Films 315, 257 (1998).
9. J. T. Scheper, K. W. Mesthrige, J. W. Proscia, G.-W. Lie, and C. H. Winter, Chem. Mater. 11, 3490 (1999).
10. S. Shimada and M. Yoshimatsu, Thin Solid Films 370, 146 (2000).
11. J. Koo, J.-W. Lee, T. Doh, Y. Kim, Y.-D. Kim, and H. Jeon, J. Vac. Sci. Technol. A 19, 2831 (2001).
12. I. Petrov, E. Mojab, F. Adibi, J. E. Greene, L. Hultman, and J.-E. Sundgren, J. Vac. Sci. Technol. A 11, 11 (1993).
13. D.-F. Lii, J. Mater. Sci. 33, 2137 (1998).
14. S.-H. Lee, H.-J. Ryoo, and J.-J. Lee, J. Vac. Sci. Technol. A 12, 1602 (1994).
15. D.-F. Lii, J. Lay, and B.-Y. Shew, Thin Solid Films 335, 122 (1998).
16. J. H. Hsieh, C. Liang, C. H. Yu, and W. Wu, Surf. Coat. Technol. 108-109, 132 (1998).
17. T. Suntola, Thin Solid Films 216, 84 (1992).
18. M. Juppo, P. Alén, M. Ritala, and Markku Leskelä, Chem. Vap. Deposition 7, 211 (2001).
19. Y. J. Lee and S.-W. Kang, J. Vac. Sci. Technol. A 20, 1983 (2002).
20. S. Shimada and M. Yoshimatsu, Thin Solid Films 370, 146 (2000).
21. J. Y. Kim, H. K. Kim, Y. Kim, Y. D. Kim, W. M. Kim, and H. Jeon, J. Korean Phys. Soc. 40, 176 (2002).