Modeling of reactively sputtered TiAlN films

Thin Solid Films

Volumn 335, Issue 1-2, 1998, Pages 122-126

  Lii, Ding Fwu ^a   Huang, Jow Lay ^b   Shew, Bor Yuan ^b  

^a Chinese Naval Academy Kaohsiung   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Alloys; Aluminum; Auger electron spectroscopy; Physical vapor deposition

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPUTER SIMULATION; REACTION KINETICS; SPUTTERING; STEEL; STOICHIOMETRY; SUBSTRATES; TITANIUM ALLOYS; VAPOR DEPOSITION;

COVERAGE FRACTION; REACTIVE SPUTTERING;

THIN FILMS;

EID: 0032320114     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00969-9     Document Type: Article

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