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Volumn 43, Issue 15, 2003, Pages 1595-1602

Fine grinding of silicon wafers: A mathematical model for grinding marks

Author keywords

Grinding; Machining; Modeling; Semiconductor material; Silicon wafer

Indexed keywords

GRINDING (MACHINING); MATHEMATICAL MODELS; POLISHING; SEMICONDUCTOR MATERIALS;

EID: 0141951884     PISSN: 08906955     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0890-6955(03)00187-1     Document Type: Article
Times cited : (41)

References (27)
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    • Tricard, M.1    Kassir, S.2    Herron, P.3    Pei, Z.J.4
  • 3
    • 0141959527 scopus 로고    scopus 로고
    • Silicon wafer shipments, revenue fell sharply in 2001
    • February 12
    • Silicon wafer shipments, revenue fell sharply in 2001, East Bay Business Times, February 12, 2002, retrieved from: http://eastbay.bizjournals.com/eastbay/.
    • (2002) East Bay Business Times
  • 10
    • 0035456947 scopus 로고    scopus 로고
    • A comparative study between total thickness variance and site flatness of polished silicon wafer
    • Oh H.S., Lee H.L. A comparative study between total thickness variance and site flatness of polished silicon wafer. Japanese Journal of Applied Physics. 40:(9A):2001;5300-5301.
    • (2001) Japanese Journal of Applied Physics , vol.40 , Issue.9 A , pp. 5300-5301
    • Oh, H.S.1    Lee, H.L.2
  • 11
    • 0032659647 scopus 로고    scopus 로고
    • Materials quality and materials cost - Are they on a collision course?
    • Ravi K.V. Materials quality and materials cost - are they on a collision course? Solid State Phenomena. 69-70:1999;103-110.
    • (1999) Solid State Phenomena , vol.69-70 , pp. 103-110
    • Ravi, K.V.1
  • 12
    • 0141959526 scopus 로고    scopus 로고
    • SEMI M1-0600, Semiconductor Equipment and Materials International, San Jose, CA
    • Specifications for polished mono-crystalline silicon wafers, SEMI M1-0600, Semiconductor Equipment and Materials International, San Jose, CA, 2000.
    • (2000) Specifications for Polished Mono-crystalline Silicon Wafers
  • 19
    • 0032590886 scopus 로고    scopus 로고
    • Three hundred-mm wafers: A technological and an economical challenge
    • Dietrich H., Bergholz W., Dubbert S. Three hundred-mm wafers: a technological and an economical challenge. Microelectronic Engineering. 45:1999;183-190.
    • (1999) Microelectronic Engineering , vol.45 , pp. 183-190
    • Dietrich, H.1    Bergholz, W.2    Dubbert, S.3
  • 22
    • 0028094382 scopus 로고
    • Generation of parabolic and toroidal surfaces on silicon and silicon-based compounds using diamond cup grinding wheels
    • Zhong Z., Venkatesh V.C. Generation of parabolic and toroidal surfaces on silicon and silicon-based compounds using diamond cup grinding wheels. Annual of CIRP. 43:(1):1994;323-326.
    • (1994) Annual of CIRP , vol.43 , Issue.1 , pp. 323-326
    • Zhong, Z.1    Venkatesh, V.C.2
  • 24
    • 0033154064 scopus 로고    scopus 로고
    • Precision cylindrical face grinding
    • Shih A.J., Lee N.L. Precision cylindrical face grinding. Precision Engineering. 23:(3):1999;177-184.
    • (1999) Precision Engineering , vol.23 , Issue.3 , pp. 177-184
    • Shih, A.J.1    Lee, N.L.2
  • 27
    • 0026630809 scopus 로고
    • Characterisation of deformations and texture defects on polished wafers of III-V compound crystals by the magic mirror method
    • Shiue C.C., Lie K.H., Blaustein P.R. Characterisation of deformations and texture defects on polished wafers of III-V compound crystals by the magic mirror method. Semiconductor Science and Technology. 7:(1A):1992;95-97.
    • (1992) Semiconductor Science and Technology , vol.7 , Issue.1 A , pp. 95-97
    • Shiue, C.C.1    Lie, K.H.2    Blaustein, P.R.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.