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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 670-681

Characterization of a laser produced plasma source for a laboratory EUV reflectometer

(9) Scholze, Frank a Scholz, Frank a Tümmler, Johannes a Ulm, Gerhard a Legall, Herbert b Nickles, Peter Viktor b Sandner, Wolfgang b Stiel, Holger b Van Loyen, Ludwig c

a PHYSIKALISCH TECHNISCHE BUNDESANSTALT (Germany)

b MAX BORN INSTITUT (Germany)

c FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS (Germany)

Author keywords

At wavelength characterization; EUV lithography; EUV sources; Extreme UV; Reflectometry

Indexed keywords

LASER BEAMS; LASER PRODUCED PLASMAS; LIGHT EMISSION; OPTICAL MULTILAYERS; OPTICAL VARIABLES MEASUREMENT; PHOTONS; REFLECTOMETERS; SPECTROMETERS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; EXTREME ULTRAVIOLET SOURCE; EXTREME ULTRAVIOLET SPECTROMETER; IMAGING SPECTROMETER; SPECTRAL PHOTON FLUX;

PHOTOLITHOGRAPHY;

EID: 0141836024 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.482646 Document Type: Conference Paper

Times cited : (9)

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