Pellicle-induced reticle distortion: An experimental investigation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 167-172

  Chen, Wen ^a   Carroll, Jim ^a   Storm, Glenn ^a   Ivancich, Ron ^a   Maloney, John ^a   Maurin, Olivier ^a   Souleillet, Eric ^a  

^a DuPont Photomasks Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; PHOTOLITHOGRAPHY; RELAXATION PROCESSES; STRESSES;

PELLICLES; PHOTOMASKS; RETICLES;

MASKS;

EID: 0032300261     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332822     Document Type: Conference Paper

References (0)