Pellicle-Induced Distortions in Advanced Photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 589-596

  Fujita, Minoru ^c   Akiyama, Masaya ^c   Kondo, Masahiri ^c   Nakagawa, Hiroaki ^c   Tanzil, Daniel ^a   Eschbach, Florence O ^a   Cotte, Eric P ^b   Engelstad, Roxann L ^b   Lovell, Edward G ^b  

^a INTEL CORPORATION   (United States)

^b Wisconsin Electric Machines and Power Electronics Consortium   (United States)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVES; COMPUTER SIMULATION; DYNAMIC MECHANICAL ANALYSIS; ELASTIC MODULI; FINITE ELEMENT METHOD;

PELLICLE-INDUCED DISTORTIONS;

MASKS;

EID: 18744372406     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476974     Document Type: Conference Paper

References (3)

1. Cotte, E.P., Engelstad, R.L., Lovell, E.G., Tanzil, D., Eschbach, F.O., and Shu, E.Y., "Experimental and Numerical Studies of the Effects of Materials and Attachment Conditions on Pellicle-Induced Distortions in Advanced Photomasks," to appear in the Proceedings of Photomask Japan, 2002.
2. Cotte, E.P., Engelstad, R.L., Lovell, E.G., Shkel, Y.E., Eschbach, F.O., Shu, E.Y., Tanzil, D. and Calhoun, R., A "Distortions in Advanced Phtotomasks from Soft pellicles," to appear in the Microelectronic Engineering, 2001.
3. Cotte, E.P., Engelstad, R.L., Lovell, E.G., Shkel, Y.E., Eschbach, F.O., Shu, E.Y., Tanzil, D. and Calhoun, R.M., A "Numerial and Experimental Studies of Pellicle-Induced Photomasks Distortions," Proceedings of the 21st BACUS Symposium on Photomask Technology, vol. 4562, pp. 641-651, 2001.