Numerical and experimental studies of pellicle-induced photomask distortions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 641-651

  Cotte, Eric P ^a,c   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Shkel, Yuri M ^a   Eschbach, Florence O ^b   Shu, Emily Y ^b   Tanzil, Daniel ^b   Calhoun, Rebecca M ^b  

^a Computational Mechanics Center ^*  (United States)

^b INTEL CORPORATION   (United States)

^c University of Wisconsin Madison   (United States)

Author keywords

157 nm lithography; Pellicle; Photomask; Reticle handling

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; DEGRADATION; FINITE ELEMENT METHOD; FUSED SILICA; LIGHT REFRACTION; PHOTOLITHOGRAPHY;

PHOTOMASK DISTORTIONS;

MASKS;

EID: 0035763806     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458346     Document Type: Article

References (5)

1. Chen, W., Carroll, J., Storm, G., Ivancich, R., Maloney, J., Maurin, O., and Souleillet, E., "Pellicle-Induced Reticle Distortion: An Experimental Investigation," SPIE, Vol. 3546, pp. 167-172, 1998.
2. Röth, K.-D., and Struck, T., "Pellicle-Induced Distortions on Photomasks," SPIE, Vol. 3412, pp. 440-446, 1998.
3. nd International Symposium on 157 nm Lithography, International SEMATECH, 2001.
4. Cotte, E., Engelstad, R., Lovell, Shkel, Y., E., Eschbach, F., Shu, E., Tanzil, D., and Calhoun, R., "Distortions in Advanced Photomasks from Soft Pellicles," to appear in the Proceedings of MNE, 2001.
5. th ed., Addison-Wesley Publishing, Reading, MA, 1982.