Distortions in advanced photomasks from soft pellicles

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 187-192

  Cotte, E P ^a   Engelstad, R L ^a   Lovell, E G ^a   Shkel, Y M ^a   Eschbach, F O ^b   Shu, E Y ^b   Tanzil, D ^b   Calhoun, R M ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

157 nm Lithography; Distortions; Experimental; Numerical; Pellicle; Reticle handling

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY;

PHOTOMASKS;

MASKS;

EID: 0036643918     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00525-7     Document Type: Conference Paper

References (3)

1. Pellicle-induced reticle distortion: An experimental investigation
2. Pellicle-induced distortions on photomasks
3. Predicting pellicle-induced distortions for 157 nm lithography