Experimental and numerical studies of the effects of materials and attachment conditions on pellicle-induced distortions in advanced photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 579-588

  Cotte, Eric P ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Tanzil, Daniel ^b   Eschbach, Florence O ^b   Shu, Emily Y ^b  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Distortion; Lithography; Overlay; Pellicle; Photomask; Reticle

Indexed keywords

ADHESIVES; FINITE ELEMENT METHOD; FUSED SILICA; PHOTOLITHOGRAPHY;

PELLICLE-INDUCED DISTORTIONS;

MASKS;

EID: 0036458860     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476972     Document Type: Conference Paper

References (4)

1. Chen, W., Carroll, J., Storm, G., Ivancich, R., Maloney, J., Maurin, O., and Souleillet, E., "Pellicle-Induced Reticle Distortion: An Experimental Investigation," SPIE, Vol. 3546, pp. 167-172, 1998.
2. Röth, K.-D., and Struck, T., "Pellicle-Induced Distortions on Photomasks," SPIE, Vol. 3412, pp. 440-446, 1998.
3. nd International Symposium on 157 nm Lithography, International SEMATECH, 2001.
4. Cotte, E., Engelstad, R., Lovell, Shkel, Y., E., Eschbach, F., Shu, E., Tanzil, D., and Calhoun, R., "Distortions in Advanced Photomasks from Soft Pellicles," to appear in Microelectronic Engineering, 2001.