Pellicle induced distortions on photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 440-446

  Röth, Klaus Dieter ^a   Struck, Thomas ^b  

^a Leica Mikroskopie und Systeme GmbH   (Germany)

^b SIEMENS AG   (Germany)

Author keywords

Distortions; LMS; Mask metrology; Pellicle; Pelliclization

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; LENSES; LOGIC DEVICES; PATTERN RECOGNITION;

MANUAL PELLICLE MOUNTING; MASK METROLOGY; PELLICLE INDUCED DISTORTIONS; PELLICLIZATION; PHOTOMASKS;

MASKS;

EID: 0001700083     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328829     Document Type: Conference Paper

References (3)

1. The National Technology Roadmap for Semiconductors (SIA Roadmap), December 1997
2. J.M. Sohn, et al, Mask Technology for 0.18μm device generation, Bacus News Vol. 12, Issue 7, 1996
3. K.-D. Röth, K. Rinn, Mask Metrology for High End Semiconductor Application Using the LEICA LMS IPRO, Scientific and Technical Information, Vol.XI, No.5, pp.130-135, 1997