A concave-type structure of a Ru electrode capacitor fabricated by the reactive ion etching method

Microelectronic Engineering

Volumn 70, Issue 1, 2003, Pages 30-34

  Ju, Byong Sun ^a   Kim, Hyoun Woo ^b  

^a SAMSUNG Electronics   (South Korea)

^b Inha University   (South Korea)

Author keywords

Concave; Etching; Ru; Scanning electron microscopy

Indexed keywords

ANTIREFLECTION COATINGS; ELECTRODES; ELECTROLYTIC CAPACITORS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY;

ELECTRODE CAPACITORS;

RUTHENIUM;

EID: 0141754210     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00364-2     Document Type: Article

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