Etching of platinum thin films in an inductively coupled plasma

Applied Surface Science

Volumn 169-170, Issue , 2001, Pages 638-643

  Wuu, Dong Sing ^a   Kuo, Nai Hao ^a   Liao, Fang Ching ^a   Horng, Ray Hua ^b   Lee, Ming Kwei ^c  

^a DA YEH UNIVERSITY   (Taiwan)

^b NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^c NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ELECTRODES; HALOGEN COMPOUNDS; ION BOMBARDMENT; MASKS; PHOTORESISTS; PLASMA ETCHING; PLATINUM; SECONDARY ION MASS SPECTROMETRY; THIN FILMS;

FENCE-FREE PLATINUM ELECTRODES; INDUCTIVELY COUPLED PLASMAS;

DIELECTRIC FILMS;

EID: 0035127118     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00803-5     Document Type: Article

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