Plasma molding over deep trenches and the resulting ion and energetic neutral distributions

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1248-1253

  Kim, Doosik ^a   Economou, Demetre J ^a  

^a University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC FIELD EFFECTS; IONS; MONTE CARLO METHODS;

PLASMA MOLDING;

PLASMA THEORY;

EID: 0141681371     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1574049     Document Type: Conference Paper

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