Fundamental beam studies of deuterium and fluorine radical reaction kinetics on surfaces

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1391-1402

  Greer, Frank ^a   Fraser, D ^a   Cobum, J W ^a   Graves, David B ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; DEUTERIUM; ELECTRON BEAMS; MASS SPECTROMETRY; PHOTORESISTS; PROBABILITY; QUARTZ;

HETERONUCLEAR ABSTRACTION PROBABILITIES;

MICROELECTRONICS;

EID: 0141681280     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1585065     Document Type: Conference Paper

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