Reaction of the fluorine atom and molecule with the hydrogen-terminated Si(111) surface

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 1, 1998, Pages 345-355

  Morikawa, Yasuhiro ^a   Kubota, Kazuhiro ^a   Ogawa, Hiroki ^a,b   Ichiki, Takanori ^a   Tachibana, Akitomo ^a,c   Fujimura, Shuzo ^a,b   Horiike, Yasuhiro ^a  

^a TOYO UNIVERSITY   (Japan)

^b FUJITSU LABORATORIES LTD   (Japan)

^c KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032342374     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581004     Document Type: Article

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