Deuterium and fluorine radical reaction kinetics on photoresist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 145-153

  Greer, Frank ^a   Coburn, J W ^a   Graves, David B ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; ETCHING; ION BEAMS; ION BOMBARDMENT; MASS SPECTROMETRY; MATHEMATICAL MODELS; PROBABILITY; REACTION KINETICS; SURFACE REACTIONS;

RADICAL REACTIONS; RECOMBINATION PROBABILITIES;

PHOTORESISTS;

EID: 0036124614     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1430242     Document Type: Conference Paper

References (10)

1. Plasma etching and reactive ion etching