Chlorine-induced restructuring of the Cu/Si(111) surface

Physical Review B - Condensed Matter and Materials Physics

Volumn 68, Issue 7, 2003, Pages

  Potapenko, V ^a   Sysoev, E ^a   Ermakov, V ^a   Hinch, J ^a   Strongin, R ^b   Wright, P ^c   Kuivila, C ^d  

^a RUTGERS UNIVERSITY   (United States)

^b Temple University   (United States)

^c DOW CORNING CORPORATION   (United States)

^d Dow Corning Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; COPPER COMPLEX; SILANE DERIVATIVE; SILICON;

ARTICLE; AUGER ELECTRON SPECTROSCOPY; CRYSTAL STRUCTURE; CRYSTALLIZATION; SCANNING TUNNELING MICROSCOPY;

EID: 0141676976     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.68.075408     Document Type: Article

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