Chlorosilane production from chlorine-exposed Si(111) 7 × 7 and Cu/Si(111) surfaces

Journal of Physical Chemistry B

Volumn 106, Issue 8, 2002, Pages 2018-2025

  Sysoev, S E ^a   Potapenko, D V ^a   Ermakov, A V ^a   Hinch, B J ^a   Strongin, D R ^b   Wright, A P ^c,d   Kuivila, C ^e  

^a RUTGERS UNIVERSITY   (United States)

^b Temple University   (United States)

^c DOW CORNING CORPORATION   (United States)

^d Strem Chemicals Inc   (United States)

^e Dow Corning Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LANGMUIR ADSORPTION;

ADSORPTION; ANNEALING; AUGER ELECTRON SPECTROSCOPY; CHLORINE; LOW ENERGY ELECTRON DIFFRACTION; SILANES; TEMPERATURE PROGRAMMED DESORPTION; THIN FILMS;

SURFACE REACTIONS;

EID: 0037187145     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp013438+     Document Type: Article

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