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Volumn 487, Issue 1-3, 2001, Pages 39-48

Atomic structure and growth of the Cu/Si(1 1 1)-"5 × 5" phase

Author keywords

Copper; Epitaxy; Growth; Low energy electron diffraction (LEED); Scanning tunneling microscopy; Silicon

Indexed keywords

ANNEALING; ATOMIC PHYSICS; COPPER; EPITAXIAL GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MATHEMATICAL MODELS; MONOLAYERS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON;

EID: 0035919909     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)00895-0     Document Type: Article
Times cited : (22)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.