Thermal chemistry of chlorine on Si/Cu(100)

Langmuir

Volumn 16, Issue 16, 2000, Pages 6541-6545

  Han, J ^a   Gheyas, S I ^a   Wang, Y ^a   Strongin, D R ^a   Hinch, B J ^b   Wright, A P ^c  

^a Temple University   (United States)

^b RUTGERS UNIVERSITY   (United States)

^c DOW CORNING CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; COPPER ALLOYS; LOW ENERGY ELECTRON DIFFRACTION; SCANNING TUNNELING MICROSCOPY; SILICON COMPOUNDS; TEMPERATURE PROGRAMMED DESORPTION; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON DEPOSITION; THERMAL CHEMISTRY;

SURFACE CHEMISTRY;

EID: 0034246193     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la000084p     Document Type: Article

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