Cl2 surface chemistry on Cu/Si(1 0 0): An ISS, XPS, and TPD study

Surface Science

Volumn 474, Issue 1-3, 2001, Pages 129-138

  Gheyas, S I ^a   Strahle, B L ^a   Strongin, D R ^a   Wright, A P ^b  

^a Temple University   (United States)

^b DOW CORNING CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; COPPER; SEMICONDUCTING SILICON; TEMPERATURE PROGRAMMED DESORPTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ION SCATTERING SPECTROSCOPY; SILICIDES;

SURFACE CHEMISTRY;

EID: 0034817603     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)01060-8     Document Type: Article

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