Evaluation of photoacid generators in chemically amplified resists for X-ray lithography using an on-wafer photoacid determination technique

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 466-472

  Lu, Bing ^a   Dentinger, Paul M ^a   Taylor, James W ^a   Feke, Gilbert D ^a   Hessman, Dan ^a   Wu, Qiang ^a   Grober, Robert D ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BROMINE COMPOUNDS; CHLORINE COMPOUNDS; IODINE COMPOUNDS; ORGANIC ACIDS; PHENOLS; PHOTORESISTS; THICKNESS MEASUREMENT;

CHEMICALLY AMPLIFIED RESISTS; PHOTOACID GENERATORS;

X RAY LITHOGRAPHY;

EID: 0032654740     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351121     Document Type: Conference Paper

References (12)